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Research project: Nanoimprint lithography process development

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Nanoimprint Lithography (NIL) created patterned structures by imprinting a stamp into a low viscous resist.  It is essentially an embossing tool at nanometre resolutions.

In this project an analytical model of the de-embossing process has been created.  This will then be compared to finite element models and experimental data to compare its capabilities.  The aim is to have an analytical model to save time and cost during imprint design. 

The work is sponsored by the Engineering and Physical Sciences Research Council (EPSRC) and Innos, a research and development company for innovations in nanoscale technology with a special interest in the emerging field of Organic Electronics.

Conferences and events associated with this project:

Comparison of lithography processes
Comparison of lithography processes
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