About the Lithography facility
Lithography is a central process in fabrication and nanofabrication. It is the technique by which design patterns are transferred to a sensitive resist.
We provide lithography through a mixture of techniques:
- optical lithography uses UV mask aligners for pattern resolutions of down to 0.5µm
- electron-beam lithography is used for smaller feature sizes
As an alternative to e-beam lithography we also have a focussed ion beam (FIB) system as part of our characterisation facilities. This is a multi nanofabrication tool system and produces very high resolution direct write lithography.
We also offer resist processing and alternative nanopatterning techniques such as microcontact printing and nano-imprint lithography.
The lithography facilities are part of our clean room at the nanofabrication centre.